Engineering Thin Films and Nanostructures with Ion Beams

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  • Engels
  • Hardcover
  • 9780824724474
  • 06 april 2005
  • 592 pagina's
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Samenvatting

From the basics of the ion-beam modification of materials onwards, this book offers a retrospective of the technology and illustrates the wider landscape for which ion beam techniques are becoming increasingly applicable. It includes a CD-ROM with video clips from an electron microscope that details crater formation and annealing by ion beams.



While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.

Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:

  • Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces
  • Considers how ion-beam techniques can help achieve higher disk-drive densities
  • Introduces gas-cluster ion-beam technology and reviews its precedents
  • Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties
  • Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting
  • Examines the combination of ion-beam techniques, particularly with physical vapor deposition
  • Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques
  • Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation
  • Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams

    From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
  • Productspecificaties

    Inhoud

    Taal
    en
    Bindwijze
    Hardcover
    Oorspronkelijke releasedatum
    06 april 2005
    Aantal pagina's
    592
    Illustraties
    Nee

    Betrokkenen

    Hoofdauteur
    Knystautas Emile
    Tweede Auteur
    Knystautas Knystautas
    Hoofdredacteur
    Emile Knystautas
    Hoofduitgeverij
    CRC Press Inc

    Vertaling

    Originele titel
    Engineering Thin Films and Nanostructures with Ion Beams

    Overige kenmerken

    Editie
    illustrated edition
    Extra groot lettertype
    Nee
    Product breedte
    152 mm
    Product lengte
    229 mm
    Studieboek
    Nee
    Verpakking breedte
    152 mm
    Verpakking hoogte
    229 mm
    Verpakking lengte
    229 mm
    Verpakkingsgewicht
    929 g

    EAN

    EAN
    9780824724474

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    2005. Hardcover.. 574pp. References. Glossary.. Index.. With the CD-Rom.
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