Metal-Dielectric Interfaces in Gigascale Electronics Thermal and Electrical Stability
Afbeeldingen
Sla de afbeeldingen overArtikel vergelijken
- Engels
- Hardcover
- 9781461418115
- 01 december 2011
- 149 pagina's
Samenvatting
Metal-dielectric interfaces are ubiquitous in modern electronics.
Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces.Metal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate interface phenomena and the principles that govern them.
Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material presented here will also be of interest to those engaged in field-effect transistor and memristor device research, as well as university researchers and industrial scientists working in the areas of electronic materials processing, semiconductor manufacturing, memory chips, and IC design. Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces
Features fundamental considerations in the physics and chemistry of metal-dielectric interactions
Explores mechanisms of metal atom diffusion and metal ion drift in dielectrics
Provides keys to understanding reliability in gigascale electronics
Focuses on a dynamic area of current research that is a foundation of futureinterconnect systems, memristors, and solid-state electrolyte devices
Metal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate interface phenomena and the principles that govern them.
Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material presented here will also be of interest to those engaged in field-effect transistor and memristor device research, as well as university researchers and industrial scientists working in the areas of electronic materials processing, semiconductor manufacturing, memory chips, and IC design.Productspecificaties
Inhoud
- Taal
- en
- Bindwijze
- Hardcover
- Oorspronkelijke releasedatum
- 01 december 2011
- Aantal pagina's
- 149
- Illustraties
- Nee
Betrokkenen
- Hoofdauteur
- Ming He
- Tweede Auteur
- Toh-Ming Lu
- Co Auteur
- Toh-Ming Lu
- Hoofduitgeverij
- Springer-Verlag New York Inc.
Overige kenmerken
- Editie
- 2012
- Extra groot lettertype
- Nee
- Product breedte
- 155 mm
- Product lengte
- 235 mm
- Studieboek
- Nee
- Verpakking breedte
- 160 mm
- Verpakking hoogte
- 15 mm
- Verpakking lengte
- 242 mm
- Verpakkingsgewicht
- 385 g
EAN
- EAN
- 9781461418115
Je vindt dit artikel in
- Categorieën
- Taal
- Engels
- Beschikbaarheid
- Leverbaar
- Boek, ebook of luisterboek?
- Boek
- Studieboek of algemeen
- Algemene boeken
Kies gewenste uitvoering
Prijsinformatie en bestellen
De prijs van dit product is 83 euro en 48 cent. De meest getoonde prijs is 110 euro en 99 cent. Je bespaart 25%. Dit is een tweedehands product.- Bestellen en betalen via bol
- Prijs inclusief verzendkosten, verstuurd door Bogamo 1 - Boeken outlet
- 30 dagen bedenktijd en gratis retourneren
Rapporteer dit artikel
Je wilt melding doen van illegale inhoud over dit artikel:
- Ik wil melding doen als klant
- Ik wil melding doen als autoriteit of trusted flagger
- Ik wil melding doen als partner
- Ik wil melding doen als merkhouder
Geen klant, autoriteit, trusted flagger, merkhouder of partner? Gebruik dan onderstaande link om melding te doen.